Designing With Light: How Microchips Are Made Using Photolithography
Students design a simple opaque mask using materials such as foilCopyright Doug Picard
Students simulate the photolithography process used in semiconductor manufacturing by using gel nail polish as a UV-sensitive photoresist. They design a simple opaque mask using materials such as construction paper or foil, then place it over the coated disc. Using an overhead UV light, they expose the disc for varying times to simulate under-, proper-, and over-exposure. Uncured gel is removed with acetone, revealing a hardened pattern that mimics how microchips are fabricated. Students analyze the results, compare them to their original mask design, and discuss the effects of exposure time and resolution. This activity connects to NGSS standards in physical science and engineering design by exploring light–matter interactions, energy transfer, and real-world applications in microfabrication.
A semiconductor process engineer designs and optimizes the manufacturing steps for microchips, including photolithography, etching, and deposition. They work closely with materials, chemical, and electrical engineers to troubleshoot issues, improve yield, and implement new technologies. Their efforts ensure that the tiny, high-performance components in computers, smartphones, and other electronics are reliably produced.
After this activity, students should be able to:
- Model the photolithography process by creating a patterned coating on a glass disc using UV-cured gel nail polish.
- Analyze how exposure time and masking affect polymerization and pattern resolution.
- Connect the experiment to real-world applications in semiconductor manufacturing and electronics engineering.